Invention Application
US20080021147A1 Process for forming a dispersion of silica nano-particles 审中-公开
形成二氧化硅纳米颗粒分散体的方法

  • Patent Title: Process for forming a dispersion of silica nano-particles
  • Patent Title (中): 形成二氧化硅纳米颗粒分散体的方法
  • Application No.: US11818461
    Application Date: 2007-06-14
  • Publication No.: US20080021147A1
    Publication Date: 2008-01-24
  • Inventor: Jun Lin
  • Applicant: Jun Lin
  • Main IPC: C08K3/36
  • IPC: C08K3/36
Process for forming a dispersion of silica nano-particles
Abstract:
Disclosed herein is a process for preparing a dispersion of silica nano-particles. The dispersions are prepared from silica nano-particles having reactive silane groups of 1-500 nm particle size, and least 0.001 parts by weight of oligomer having at least two groups reactive with the silica nano-particles, or oligomer in combination with a film forming polymer, a low molecular weight coupling agent, or a combination of a film forming polymer and a low molecular weight coupling agent.
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