Invention Application
- Patent Title: METHODS AND APPARATUS FOR INSITU ANALYSIS OF GASES IN ELECTRONIC DEVICE FABRICATION SYSTEMS
- Patent Title (中): 电子设备制造系统气体分析方法与装置
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Application No.: US11830832Application Date: 2007-07-30
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Publication No.: US20080022751A1Publication Date: 2008-01-31
- Inventor: David Carlson , Satheesh Kuppurao
- Applicant: David Carlson , Satheesh Kuppurao
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Main IPC: G01N33/00
- IPC: G01N33/00 ; E03B5/00
Abstract:
Systems and methods are disclosed that include adjusting a pressure level of a sample gas in a testing chamber, for example, using a pressurized inert reference gas, and determining a composition of the adjusted sample gas. By adjusting the pressure level of the sample gas, the composition of the sample gas may be determined more accurately than otherwise possible. Numerous other aspects are disclosed.
Public/Granted literature
- US07770431B2 Methods and apparatus for insitu analysis of gases in electronic device fabrication systems Public/Granted day:2010-08-10
Information query
