- 专利标题: INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE
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申请号: US11771092申请日: 2007-06-29
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公开(公告)号: US20080033559A1公开(公告)日: 2008-02-07
- 发明人: James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
- 申请人: James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
- 主分类号: A61F2/44
- IPC分类号: A61F2/44
摘要:
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
公开/授权文献
- US08454659B2 Interspinous process implants and methods of use 公开/授权日:2013-06-04
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