Invention Application
US20080035950A1 METHOD TO MAKE LOW RESISTANCE CONTACT 有权
制造低电阻接触的方法

METHOD TO MAKE LOW RESISTANCE CONTACT
Abstract:
Techniques for fabricating contacts on inverted configuration surfaces of GaN layers of semiconductor devices are provided. An n-doped GaN layer may be formed with a surface exposed by removing a substrate on which the n-doped GaN layer was formed. The crystal structure of such a surface may have a significantly different configuration than the surface of an as-deposited p-doped GaN layer.
Public/Granted literature
Information query
Patent Agency Ranking
0/0