发明申请
- 专利标题： Method of manufacturing electron emission device and electron emission device manufactured by the method
- 专利标题（中）： 通过该方法制造电子发射器件和电子发射器件的方法
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申请号： US11891264申请日： 2007-08-08
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公开(公告)号： US20080036359A1公开(公告)日： 2008-02-14
- 发明人: Myung-Ick Hwang , Sung-Hee Cho , Jae-Sang Ha , Jong-Hwan Park , Deok-Hyeon Choe , Nae-Sung Lee , Jun-Seop Kim , Ji-Hyun Jeon
- 申请人： Myung-Ick Hwang , Sung-Hee Cho , Jae-Sang Ha , Jong-Hwan Park , Deok-Hyeon Choe , Nae-Sung Lee , Jun-Seop Kim , Ji-Hyun Jeon
- 优先权： KR10-2007-0079163 20070807
- 主分类号： H01J1/04
- IPC分类号： H01J1/04 ; H01J9/02
摘要：
Provided is a method of manufacturing an electron emission device. The method includes: forming electron emission sources including a carbon-based material; and emitting electrons from the electron emission sources in a chamber containing a gas. Accordingly, an electron emission display device employing the electron emission device can improve uniformity between pixels and increase device lifespan.
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