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发明申请
US20080044673A1 Method of making a metal oxide film, laminates and electronic devices 有权
制造金属氧化物膜，层压板和电子器件的方法

Method of making a metal oxide film, laminates and electronic devices
摘要：
An object is to provide a method of making a metal oxide film with a sufficiently high degree of crystal orientation, without difficulties, at low cost, and with little damage to a base material and the metal oxide film, and to provide laminates and electronic devices using the same. A method includes a step of forming a metal film having a (111) plane, on a base material; a step of forming a metal oxide film on the (111) plane of the metal film; and a step of maintaining a temperature of the metal oxide film formed on the (111) plane of the metal film, at 25-600° C. and irradiating the metal oxide film with UV light.
摘要（中）：

本发明的目的是提供一种以低成本制造具有足够高的晶体取向度的金属氧化物膜的方法，并且对基材和金属氧化物膜几乎没有损伤，并且提供层压板和电子器件 使用相同 一种方法包括在基材上形成具有（111）面的金属膜的步骤; 在金属膜的（111）面上形成金属氧化物膜的工序; 以及在金属膜的（111）面上形成的金属氧化物膜的温度保持在25〜600℃的步骤，并用紫外线照射金属氧化物膜。

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