发明申请
US20080044749A1 CIRCUIT PATTERN FORMATION DEVICE AND METHOD OF FORMING CIRCUIT PATTERN TO SUBSTRATE 有权
电路图形成装置及其形成电路图形的方法

  • 专利标题: CIRCUIT PATTERN FORMATION DEVICE AND METHOD OF FORMING CIRCUIT PATTERN TO SUBSTRATE
  • 专利标题(中): 电路图形成装置及其形成电路图形的方法
  • 申请号: US11772867
    申请日: 2007-07-03
  • 公开(公告)号: US20080044749A1
    公开(公告)日: 2008-02-21
  • 发明人: Yuichiro SanoToru Miyasaka
  • 申请人: Yuichiro SanoToru Miyasaka
  • 优先权: JP2006-185072 20060705
  • 主分类号: G03G13/18
  • IPC分类号: G03G13/18 G03G15/22
CIRCUIT PATTERN FORMATION DEVICE AND METHOD OF FORMING CIRCUIT PATTERN TO SUBSTRATE
摘要:
An object is to improve the adhesion strength between a circuit pattern and its substrate without increasing the resistance value of the circuit pattern in preparation of a circuit pattern holding substrate. A circuit pattern formation device 100 forms, after forming a precursor circuit-pattern 12 in the surface of a dielectric thin film body 4, a circuit pattern 14 onto a target substrate 23 from the dielectric thin film body. After forming an electrostatic latent image 2 in the upper surface of the dielectric thin film body, the electrostatic latent image is exposed using an exposure unit 3 to prepare a pattern. A development apparatus 7 supplies a conductive particle dispersion solution 6 to this pattern to form a precursor circuit-pattern. By energizing the circuit pattern holding substrate 8, in which an adhesive layer 22 is formed, the precursor circuit-pattern is temporarily transferred to the circuit pattern holding substrate. The transferred precursor circuit-pattern is heated using the heater 13 to form a circuit pattern. The circuit pattern and the adhesive layer are released from the circuit pattern holding substrate, thereby transferring to the target substrate.
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