- 专利标题: Apparatus for and method of measuring composition and pressure of the discharged gas from ion gauge using residual gas analyzer
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申请号: US11551708申请日: 2006-10-21
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公开(公告)号: US20080048663A1公开(公告)日: 2008-02-28
- 发明人: Seung Soo Hong , Kwang Hwa Chung , Yong Hyeon Shin
- 申请人: Seung Soo Hong , Kwang Hwa Chung , Yong Hyeon Shin
- 申请人地址: KR Daejeon
- 专利权人: KOREAN RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- 当前专利权人: KOREAN RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- 当前专利权人地址: KR Daejeon
- 优先权: KR10-2006-0079797 20060823
- 主分类号: G01N27/62
- IPC分类号: G01N27/62
摘要:
Disclosed herein are an apparatus for and method of measuring the composition and the pressure of the discharged gas from an ion gauge by using a residual gas analyzer. In this regard, there are provided a vacuum container 200 divided into a pressure container 210 and a discharge container 220 by means of a partition 235 having an orifice 230 formed thereon; an ion gauge 100 mounted at the pressure container 210 side of the vacuum container 200 for discharging the gas at the time of vacuum formation; a residual gas analyzer 240 mounted at the pressure container 210 side of the vacuum container 200 for measuring the composition and the pressure of the residual gas; pump means disposed at one side of the discharge container 220 of the vacuum container 200 for discharging the inside gas; and heating means disposed at the vacuum container 200 for heating the vacuum container 200 to a predetermined temperature.
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