发明申请
- 专利标题: Low-Reflection Material
- 专利标题(中): 低反射材料
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申请号: US10594769申请日: 2005-03-24
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公开(公告)号: US20080057262A1公开(公告)日: 2008-03-06
- 发明人: Kazuya Ooishi , Kensaku Higashi
- 申请人: Kazuya Ooishi , Kensaku Higashi
- 申请人地址: JP Tokyo
- 专利权人: TOMOEGAWA CO., LTD.
- 当前专利权人: TOMOEGAWA CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2004-100552 20040330
- 国际申请: PCT/JP05/05359 WO 20050324
- 主分类号: B32B7/00
- IPC分类号: B32B7/00
摘要:
A low-reflection material having a fluorine-containing polymer film which can improve abrasion resistance without increasing production cost is provided. In the low-reflection material comprising a transparent substrate, a hard coating layer provided on the transparent substrate, and a fluorine-containing polymer film provided on the hard coating layer, the hard coating layer contains ethylene oxide modified (meth)acrylate resin. Additionally, in the low-reflection material comprising a transparent substrate, a hard coating layer provided on the transparent substrate, a high refractive index layer provided on the hard coating layer, and a fluorine-containing polymer film provided on the high refractive index layer, the high refractive index layer contains ethylene oxide modified (meth)acrylate resin.
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