发明申请
- 专利标题: Microstructure and method of manufacturing the same
- 专利标题(中): 微结构及其制造方法
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申请号: US11699447申请日: 2007-01-30
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公开(公告)号: US20080057293A1公开(公告)日: 2008-03-06
- 发明人: Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- 申请人: Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-046985 20060223
- 主分类号: B32B3/26
- IPC分类号: B32B3/26 ; C25D5/00
摘要:
A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.
公开/授权文献
- US07824535B2 Microstructure and method of manufacturing the same 公开/授权日:2010-11-02
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