发明申请
- 专利标题: PHOTO-CURABLE RESIN COMPOSITION, METHOD OF PATTERNING THE SAME, AND INK JET HEAD AND METHOD OF FABRICATING THE SAME
- 专利标题(中): 光固化树脂组合物,其印刷方法和喷墨头及其制造方法
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申请号: US11850938申请日: 2007-09-06
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公开(公告)号: US20080063978A1公开(公告)日: 2008-03-13
- 发明人: Byung-Ha Park , Young-ung Ha , Sung-joon Park , Myong-jong Kwon
- 申请人: Byung-Ha Park , Young-ung Ha , Sung-joon Park , Myong-jong Kwon
- 优先权: KR2004-34430 20040514
- 主分类号: G03C1/04
- IPC分类号: G03C1/04 ; G03C5/00
摘要:
A photo-curable resin composition, a method of patterning the same, an ink jet head, and a method of fabricating the same. The photo-curable resin composition includes an epoxy compound, a photo-catalyst provided as a photo-initiator, and a non-photo reactive solvent. The photo-catalyst may be a semiconductor material to generate electron-hall pairs using light energy. The semiconductor material is one selected from a group consisting of TiO2, CdS, Si, SrTiO3, WO, ZnO, SnO2, CdSe and CdTe, CdSe and CdTe. The epoxy compound may include a di-functional epoxy compound and a multi-functional epoxy compound. The non-photo reactive solvent may be one or a mixture selected from a group consisting of gamma-butyrolactone (GBL), cyclopentanone, C1-6 acetate, tetrahydrofurane (THF), and xylene. The photo-curable resin composition is patterned to form a fluid channel structure of the ink jet head.
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