Invention Application
- Patent Title: MANUFACTURING METHOD OF THIN FILM TRANSISTOR ARRAY SUBSTRATE
- Patent Title (中): 薄膜晶体管阵列基板的制造方法
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Application No.: US11938773Application Date: 2007-11-12
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Publication No.: US20080064150A1Publication Date: 2008-03-13
- Inventor: Meng-Chi Liou , Hsiao-Fen Chen
- Applicant: Meng-Chi Liou , Hsiao-Fen Chen
- Applicant Address: TW Taipei
- Assignee: CHUNGHWA PICTURE TUBES, LTD.
- Current Assignee: CHUNGHWA PICTURE TUBES, LTD.
- Current Assignee Address: TW Taipei
- Priority: TW94137108 20051024
- Main IPC: H01L21/84
- IPC: H01L21/84

Abstract:
A thin film transistor array substrate and a manufacturing method thereof are provided. Wherein, scan lines and data lines are disposed on a substrate to define a plurality of pixel regions. Thin film transistors are disposed in the pixel regions correspondingly and driven by the scan lines and the data lines. Pixel electrodes are disposed in the pixel regions respectively and electrically connected to the corresponding thin film transistors. In addition, a gate insulating layer is disposed on the substrate to cover the scan lines and gates of the thin film transistors. A patterned leaning layer is disposed on the gate insulating layer and forms a plurality of non-continuous patterns under the data lines. The non-continuous patterns expose portions of the gate insulating layer under the data lines to which a portion of each data line can be directly attached.
Public/Granted literature
- US07566597B2 Manufacturing method of thin film transistor array substrate Public/Granted day:2009-07-28
Information query
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