发明申请
- 专利标题： LOW SCALE POTENTIAL WATER TREATMENT
- 专利标题（中）： 低规模潜在的水处理
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申请号： US11767438申请日： 2007-06-22
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公开(公告)号： US20080067069A1公开(公告)日： 2008-03-20
- 发明人: Joseph Gifford , John Arba , Evgeniya Freydina , Anil Jha , Li-Shiang Liang , Lu Wang
- 申请人： Joseph Gifford , John Arba , Evgeniya Freydina , Anil Jha , Li-Shiang Liang , Lu Wang
- 申请人地址： US PA Warrendale
- 专利权人： SIEMENS WATER TECHNOLOGIES CORP.
- 当前专利权人： SIEMENS WATER TECHNOLOGIES CORP.
- 当前专利权人地址： US PA Warrendale
- 主分类号： C02F1/469
- IPC分类号： C02F1/469 ; B01D57/02 ; B01D61/48
摘要：
An electrochemical treating device having low scale potential is disclosed. The device has a variety of configurations directed to the layering of the anionic exchange and cationic exchange. The treatment device can also comprise unevenly sized ion exchange resin beads and/or have at least one compartment that provides a dominating resistance that results in a uniform current distribution throughout the apparatus.
信息查询
