发明申请
US20080076853A1 Photopolymerizable and photocleavable resins and low shrink and low stress composite compositions
审中-公开
可光聚合和可光修复的树脂和低收缩和低应力复合组合物
- 专利标题: Photopolymerizable and photocleavable resins and low shrink and low stress composite compositions
- 专利标题(中): 可光聚合和可光修复的树脂和低收缩和低应力复合组合物
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申请号: US11811201申请日: 2007-06-08
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公开(公告)号: US20080076853A1公开(公告)日: 2008-03-27
- 发明人: Xiaoming Jin , Paul Hammesfahr
- 申请人: Xiaoming Jin , Paul Hammesfahr
- 主分类号: A61K6/08
- IPC分类号: A61K6/08 ; A61K6/083
摘要:
A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.
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