发明申请
US20080076853A1 Photopolymerizable and photocleavable resins and low shrink and low stress composite compositions 审中-公开
可光聚合和可光修复的树脂和低收缩和低应力复合组合物

  • 专利标题: Photopolymerizable and photocleavable resins and low shrink and low stress composite compositions
  • 专利标题(中): 可光聚合和可光修复的树脂和低收缩和低应力复合组合物
  • 申请号: US11811201
    申请日: 2007-06-08
  • 公开(公告)号: US20080076853A1
    公开(公告)日: 2008-03-27
  • 发明人: Xiaoming JinPaul Hammesfahr
  • 申请人: Xiaoming JinPaul Hammesfahr
  • 主分类号: A61K6/08
  • IPC分类号: A61K6/08 A61K6/083
Photopolymerizable and photocleavable resins and low shrink and low stress composite compositions
摘要:
A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.
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