Invention Application
- Patent Title: THIN FILM TRANSISTOR SUBSTRATE HAVING STRUCTURE FOR COMPENSATING FOR MASK MISALIGNMENT
- Patent Title (中): 薄膜晶体管衬底,具有用于补偿掩模缺陷的结构
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Application No.: US11859203Application Date: 2007-09-21
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Publication No.: US20080078992A1Publication Date: 2008-04-03
- Inventor: Sung-hoon YANG , So-woon KIM , Tae-hyung Hwang , Yeon-joo Kim , Soo-wan Yoon , Chong-chul Chai
- Applicant: Sung-hoon YANG , So-woon KIM , Tae-hyung Hwang , Yeon-joo Kim , Soo-wan Yoon , Chong-chul Chai
- Priority: KR10-2006-0097144 20061002
- Main IPC: H01L51/10
- IPC: H01L51/10

Abstract:
A thin film transistors (TFTs) substrate is structured to maintain as constant across the area of the substrate a kickback voltage due to Miller capacitance between the drain and gate of each TFT even in the presence of manufacturing induced misalignments between the drain electrodes and corresponding gate lines. Each thin film transistor includes a gate electrode, an active layer formed on the gate electrode so as to overlap the gate electrode, first and second source electrodes respectively connected to first and second data lines each of which crosses the gate line while being insulated from the gate line, and an elongated drain electrode located between the first and second source electrodes and disposed over the gate electrode so as to a crossing length of the drain electrode is larger than an underlying width of the gate electrode such that misalignment induced shifts of the position of the gate electrode relative to the drain electrode does not substantially change overlap area between the two.
Public/Granted literature
- US07655949B2 Thin film transistor substrate having structure for compensating for mask misalignment Public/Granted day:2010-02-02
Information query
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