发明申请
- 专利标题: Microstructure and method of manufacturing the same
- 专利标题(中): 微结构及其制造方法
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申请号: US11702189申请日: 2007-02-05
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公开(公告)号: US20080081173A1公开(公告)日: 2008-04-03
- 发明人: Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- 申请人: Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-052758 20060228
- 主分类号: C23F1/02
- IPC分类号: C23F1/02
摘要:
In a method of manufacturing a microstructure, an aluminum member having an aluminum substrate and a micropore-bearing anodized layer present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving 0.001 to 20 wt % of a material constituting the anodized layer and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized layer, thereby obtaining the microstructure having micropores formed on a surface thereof. This method enables a microstructure having an ordered array of pits to be obtained in a short period of time.
公开/授权文献
- US07648760B2 Microstructure and method of manufacturing the same 公开/授权日:2010-01-19
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