发明申请
- 专利标题: Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method
- 专利标题(中): 氢化开环易位聚合物,包含其的抗蚀剂组合物和图案化方法
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申请号: US11902775申请日: 2007-09-25
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公开(公告)号: US20080085470A1公开(公告)日: 2008-04-10
- 发明人: Tadahiro Sunaga , Yuichi Okawa , Takeshi Kinsho , Tomohiro Kobayashi
- 申请人: Tadahiro Sunaga , Yuichi Okawa , Takeshi Kinsho , Tomohiro Kobayashi
- 申请人地址: JP Minato-ku JP Chiyoda-ku
- 专利权人: Mitsui Chemicals, Inc.,Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Mitsui Chemicals, Inc.,Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Minato-ku JP Chiyoda-ku
- 优先权: JP2006-264264 20060928
- 主分类号: G03C5/00
- IPC分类号: G03C5/00 ; C08G65/00
摘要:
[Problem] Provided is a resin having an alicyclic structure in a main chain, which is excellent in etching resistance and developing property, a resist composition for exposure with a high energy radiation using the resin, and a method for forming a pattern using the resist composition. [Means to Solve] Also provided is a hydrogenated ring-opening metathesis polymer which is comprised of alicyclic skeleton-containing structural units [A], [B] and a structural unit [C] selected from the following general formula [5] and/or [6]: wherein, e and f represent respectively an integer of 0 to 3, wherein the at least one of X1 of the general formula [1] of the structural unit [A], X of the general formula [3] and X3 of the general formula [4] of the structural unit [B] is —O—, and wherein the molar ratio of the structural units [A], [B] and [C] satisfies simultaneously that [A]/([B]+[C]) is from 20/80 to 98/2, ([A]+[B])/[C] is from 99/1 to 50/50, and ([A]+[C])/[B] is from 99/1 to 21/79. Also, a resist composition comprising the same and a method for forming a pattern are provided.