发明申请
- 专利标题: Semiconductor device using magnetic domain wall movement and method of manufacturing the same
- 专利标题(中): 使用磁畴壁运动的半导体器件及其制造方法
-
申请号: US11727689申请日: 2007-03-28
-
公开(公告)号: US20080094887A1公开(公告)日: 2008-04-24
- 发明人: In-jun Hwang , Sung-chul Lee
- 申请人: In-jun Hwang , Sung-chul Lee
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2006-0101577 20061018
- 主分类号: G11C11/14
- IPC分类号: G11C11/14
摘要:
A semiconductor device using a magnetic domain wall movement and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a magnetic layer that is formed on a substrate and has a plurality of magnetic domains, and a unit that supplies energy to move a magnetic domain wall in the magnetic layer. The magnetic layer is formed parallel to the substrate, and includes a plurality of prominences and a plurality of depressions alternately formed along a lengthwise direction thereof. The magnetic layer has a stepped form that secures a reliable movement of the magnetic domain wall in units of one bit.
公开/授权文献
信息查询