发明申请
US20080094887A1 Semiconductor device using magnetic domain wall movement and method of manufacturing the same 失效
使用磁畴壁运动的半导体器件及其制造方法

Semiconductor device using magnetic domain wall movement and method of manufacturing the same
摘要:
A semiconductor device using a magnetic domain wall movement and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a magnetic layer that is formed on a substrate and has a plurality of magnetic domains, and a unit that supplies energy to move a magnetic domain wall in the magnetic layer. The magnetic layer is formed parallel to the substrate, and includes a plurality of prominences and a plurality of depressions alternately formed along a lengthwise direction thereof. The magnetic layer has a stepped form that secures a reliable movement of the magnetic domain wall in units of one bit.
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