发明申请
US20080101541A1 X-RAY SYSTEM, X-RAY APPARATUS, X-RAY TARGET, AND METHODS FOR MANUFACTURING SAME
审中-公开
X射线系统,X射线装置,X射线目标及其制造方法
- 专利标题: X-RAY SYSTEM, X-RAY APPARATUS, X-RAY TARGET, AND METHODS FOR MANUFACTURING SAME
- 专利标题(中): X射线系统,X射线装置,X射线目标及其制造方法
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申请号: US11555532申请日: 2006-11-01
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公开(公告)号: US20080101541A1公开(公告)日: 2008-05-01
- 发明人: Gregory Alan Steinlage , Michael Scott Hebert , Kirk Alan Rogers , Donald Robert Allen
- 申请人: Gregory Alan Steinlage , Michael Scott Hebert , Kirk Alan Rogers , Donald Robert Allen
- 申请人地址: US NY Schenectady
- 专利权人: GENERAL ELECTRIC COMPANY, A NEW YORK CORPORATION
- 当前专利权人: GENERAL ELECTRIC COMPANY, A NEW YORK CORPORATION
- 当前专利权人地址: US NY Schenectady
- 主分类号: H01J35/08
- IPC分类号: H01J35/08
摘要:
In some embodiments, an X-ray target is produced by the method of: stacking a primary substrate layer and a focal track layer, the primary substrate layer being formed of primary substrate material, the focal track layer being formed of emitting material; and bonding the emitting material to the primary substrate material by heating a primary compacted interface to an elevated temperature while maintaining the elevated pressure for a time period to form a primary bonded interface of the emitting material and the primary substrate material. In some embodiments, an X-ray target includes a focal track layer of emitting material, a primary substrate layer bonded to the focal track in a primary bonded interface, and a secondary substrate layer bonded to the primary substrate material in a secondary bonded interface by one of diffusion bonding, diffusion brazing and brazing.