发明申请
- 专利标题: Configuration and process for carbonyl removal
- 专利标题(中): 羰基去除的配置和工艺
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申请号: US10543438申请日: 2004-01-21
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公开(公告)号: US20080102009A1公开(公告)日: 2008-05-01
- 发明人: Ravi Ravikumar
- 申请人: Ravi Ravikumar
- 优先权: USPCT/US03/02696 20030128
- 国际申请: PCT/US04/01796 WO 20040121
- 主分类号: B01D3/02
- IPC分类号: B01D3/02 ; F01D25/00 ; F02C3/22 ; F02C7/30
摘要:
A plant includes an adsorber in which a metal is plated onto a non-metallic sacrificial materials from a metal carbonyl at a predetermined temperature. Particularly preferred adsorbers include two sections, wherein a first metal (e.g., nickel) is plated onto graphite in the first section, and wherein a second metal (e.g., iron) is plated onto graphite in the second section.
公开/授权文献
- US07597743B2 Configuration and process for carbonyl removal 公开/授权日:2009-10-06
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