发明申请
- 专利标题: MASKING APPARATUS AND METHOD OF FABRICATING ELECTRONIC COMPONENT
- 专利标题(中): 掩蔽设备和电子元件制作方法
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申请号: US11925249申请日: 2007-10-26
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公开(公告)号: US20080107873A1公开(公告)日: 2008-05-08
- 发明人: Hajime KUWAJIMA , Hitoshi Ohkubo
- 申请人: Hajime KUWAJIMA , Hitoshi Ohkubo
- 申请人地址: JP Tokyo 103-8272
- 专利权人: TDK CORPORATION
- 当前专利权人: TDK CORPORATION
- 当前专利权人地址: JP Tokyo 103-8272
- 优先权: JP2006-293245 20061027
- 主分类号: B05C11/00
- IPC分类号: B05C11/00 ; B05D5/00
摘要:
A masking apparatus includes a mask base body and a mask plate. The mask base body includes at least one spacer plate, and a cavity in which an electronic component can be housed. The mask plate is disposed on an upper surface and/or a lower surface of the mask base body. The mask plate includes a film-forming opening with a shape corresponding to the shape of an external structural body to be formed on an outer surface of the component. The mask plate thus allows a film-forming operation to be selectively performed on the outer surface of the component through the film-forming opening. The cavity includes, in an inner surface thereof, a film-forming groove communicating with the film-forming opening so that the external structural body can be formed at once on an upper surface and/or a lower surface of, and also on a peripheral surface of the component.
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