发明申请
- 专利标题: Charged particle beam apparatus
- 专利标题(中): 带电粒子束装置
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申请号: US12005387申请日: 2007-12-27
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公开(公告)号: US20080116376A1公开(公告)日: 2008-05-22
- 发明人: Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
- 申请人: Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
- 申请人地址: JP Tokyo
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP11-195375 19990709; JP11-296246 19991019; JP2000-170407 20000602
- 主分类号: H01J37/28
- IPC分类号: H01J37/28
摘要:
It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample, based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
公开/授权文献
- US07642514B2 Charged particle beam apparatus 公开/授权日:2010-01-05