发明申请
- 专利标题： Method and system for tone inverting of residual layer tolerant imprint lithography
- 专利标题（中）： 残余层容忍压印光刻的色调反转方法和系统
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申请号： US11600140申请日： 2006-11-16
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公开(公告)号： US20080118645A1公开(公告)日： 2008-05-22
- 发明人: Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
- 申请人： Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： B05D3/12
- IPC分类号： B05D3/12 ; B05C11/00
摘要：
A method (and apparatus) of imprint lithography, includes imprinting, via a patterned mask, a pattern into a resist layer on a substrate, and overlaying a cladding layer over the imprinted resist layer. A portion of the cladding layer is used as a hard mask for a subsequent processing.
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