发明申请
- 专利标题: ANTIREFLECTIVE COATINGS FOR HIGH-RESOLUTION PHOTOLITHOGRAPHIC SYNTHESIS OF DNA ARRAYS
- 专利标题(中): 用于DNA阵列高分辨光谱合成的抗反射涂层
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申请号: US12014879申请日: 2008-01-16
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公开(公告)号: US20080119371A1公开(公告)日: 2008-05-22
- 发明人: Mark TRULSON , Glenn McGall , Bei-Shen Sywe , Lisa Kajisa , Dana Truong
- 申请人: Mark TRULSON , Glenn McGall , Bei-Shen Sywe , Lisa Kajisa , Dana Truong
- 申请人地址: US CA Santa Clara 95051
- 专利权人: Affymetrix, Inc.
- 当前专利权人: Affymetrix, Inc.
- 当前专利权人地址: US CA Santa Clara 95051
- 主分类号: C40B40/06
- IPC分类号: C40B40/06 ; C40B40/14 ; C40B40/10
摘要:
The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.