Invention Application
US20080122116A1 METHOD OF FORMING METAL LAYER WIRING STRUCTURE ON BACKSIDE OF WAFER, METAL LAYER WIRING STRUCTURE FORMED USING THE METHOD, METHOD OF STACKING CHIP PACKAGE, AND CHIP PACKAGE STACK STRUCTURE FORMED USING THE METHOD
审中-公开
使用该方法形成的金属层布线结构的方法,使用该方法形成的金属层布线结构,堆叠芯片封装的方法和使用该方法形成的芯片封装堆叠结构
- Patent Title: METHOD OF FORMING METAL LAYER WIRING STRUCTURE ON BACKSIDE OF WAFER, METAL LAYER WIRING STRUCTURE FORMED USING THE METHOD, METHOD OF STACKING CHIP PACKAGE, AND CHIP PACKAGE STACK STRUCTURE FORMED USING THE METHOD
- Patent Title (中): 使用该方法形成的金属层布线结构的方法,使用该方法形成的金属层布线结构,堆叠芯片封装的方法和使用该方法形成的芯片封装堆叠结构
-
Application No.: US11942529Application Date: 2007-11-19
-
Publication No.: US20080122116A1Publication Date: 2008-05-29
- Inventor: Myeong-Soon PARK , In-Young LEE , Ho-Jin LEE , Yong-Tae OH
- Applicant: Myeong-Soon PARK , In-Young LEE , Ho-Jin LEE , Yong-Tae OH
- Applicant Address: KR Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Priority: KR2006-0116582 20061123
- Main IPC: H01L21/58
- IPC: H01L21/58 ; H01L23/522

Abstract:
Provided are a method of forming a metal layer wiring structure on the backside of a wafer, a metal layer wiring structure formed using the method, a method of stacking a chip package, and a chip package stack structure formed using the method. The method of stacking a chip package includes: forming recess patterns on a backside of wafers; forming a passivation layer on the backside of the wafers except for an area corresponding to a through electrode; forming a metal layer on the passivation layer; planarizing the metal layers to expose only the recess patterns; forming a lower insulating layer on the planarized metal layers except for an area corresponding to a contact portion with another wafer; forming an adhesive layer on the lower insulating layer of each of the wafers; and adhering the wafers to one another, wherein the recess patterns are formed using a laser.
Information query
IPC分类: