A method of manufacturing a stamper/imprinter for patterning of a recording medium via thermally assisted nano-imprint lithography, comprising steps of: providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; injection molding a layer of a polymeric material in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the topographically patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface including a plurality of projections and depressions with dimensions and spacings having a correspondence to the selected pattern to be formed in a surface of the medium.