发明申请
- 专利标题: THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 薄膜晶体管基板及其制造方法
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申请号: US11944010申请日: 2007-11-21
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公开(公告)号: US20080135845A1公开(公告)日: 2008-06-12
- 发明人: Seong-Kweon HEO , Chun-Gi YOU
- 申请人: Seong-Kweon HEO , Chun-Gi YOU
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2006-0125231 20061211
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H01L21/84
摘要:
A thin-film transistor substrate includes a gate line, a capacitor dielectric layer, a gate insulation layer, an active pattern, a data line, a protection layer, and a pixel electrode. The gate wiring including a gate electrode, a lower storage electrode, and a gate metal pad is disposed on a substrate. The capacitor dielectric layer is disposed on the lower storage electrode and the gate insulation layer is disposed on the substrate. The active pattern includes an active layer and a dummy active layer disposed on the gate insulation layer in a gate electrode region and a gate metal pad region, respectively. A portion of the upper storage electrode is disposed on the capacitor dielectric layer exposed through a first contact hole in the gate insulation layer.
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