发明申请
- 专利标题: SEMICONDUCTOR WAFER, METHOD OF MANUFACTURING THE SAME AND SEMICONDUCTOR DEVICE
- 专利标题(中): 半导体器件,其制造方法和半导体器件
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申请号: US11951441申请日: 2007-12-06
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公开(公告)号: US20080135975A1公开(公告)日: 2008-06-12
- 发明人: Yukiko Haraguchi , Takahiro Kumakawa , Takashi Yui , Kazumi Watase
- 申请人: Yukiko Haraguchi , Takahiro Kumakawa , Takashi Yui , Kazumi Watase
- 申请人地址: JP Kadoma-shi
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Kadoma-shi
- 优先权: JP2006-332715 20061211
- 主分类号: H01L27/00
- IPC分类号: H01L27/00 ; H01L21/82
摘要:
A modified layer 5 and an altered layer 8 are formed outside a dicing point of a dicing area 3. Thus without forming another interface between different physical properties on the dicing point, it is possible to prevent chipping from progressing along a crystal orientation from an interface between a semiconductor element 2 and a semiconductor substrate 1 and from a surface of the semiconductor element during dicing, thereby suppressing the development of chipping to the semiconductor element.
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