发明申请
- 专利标题： Thiol Compound And Photosensitive Composition Using The Same
- 专利标题（中）： 硫醇化合物和使用它的光敏组合物
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申请号： US11666223申请日： 2005-10-25
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公开(公告)号： US20080139688A1公开(公告)日： 2008-06-12
- 发明人: Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
- 申请人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
- 申请人地址： JP Minato-ku
- 专利权人： SHOWA DENKO K.K.
- 当前专利权人： SHOWA DENKO K.K.
- 当前专利权人地址： JP Minato-ku
- 优先权： JP2004-311234 20041026; JP2004-311276 20041026
- 国际申请： PCT/JP05/19959 WO 20051025
- 主分类号： C08F2/46
- IPC分类号： C08F2/46 ; C07C323/56
摘要：
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
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