发明申请
- 专利标题： Chemically amplified positive resist compostion
- 专利标题（中）： 化学放大阳性抗蚀剂组合
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申请号： US11984098申请日： 2007-11-13
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公开(公告)号： US20080153036A1公开(公告)日： 2008-06-26
- 发明人: Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
- 申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2006-321460 20061129
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
公开/授权文献
- US07972763B2 Chemically amplified positive resist composition 公开/授权日：2011-07-05
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