发明申请
US20080163890A1 TUNABLE MEGASONICS CAVITATION PROCESS USING MULTIPLE TRANSDUCERS FOR CLEANING NANOMETER PARTICLES WITHOUT STRUCTURE DAMAGE
审中-公开
使用多个传感器进行清洁微粒渗透处理的方法，用于清洁没有结构损伤的纳米颗粒
- 专利标题： TUNABLE MEGASONICS CAVITATION PROCESS USING MULTIPLE TRANSDUCERS FOR CLEANING NANOMETER PARTICLES WITHOUT STRUCTURE DAMAGE
- 专利标题（中）： 使用多个传感器进行清洁微粒渗透处理的方法，用于清洁没有结构损伤的纳米颗粒
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申请号： US11971412申请日： 2008-01-09
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公开(公告)号： US20080163890A1公开(公告)日： 2008-07-10
- 发明人: JOHN J. ROSATO , Madhava Rao Yalamanchili , Victor Burton Mimken
- 申请人： JOHN J. ROSATO , Madhava Rao Yalamanchili , Victor Burton Mimken
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： B08B3/12
- IPC分类号： B08B3/12
摘要：
A method and system for cleaning a substrate is provided. More particularly systems and methods that allows for precise tailoring of megasonics distribution at a substrate surface to be above the threshold required for particle removal efficiency (PRE), yet below the value which causes structural damage are provided. This method utilizes multiple megasonics transducers operated at very low power densities in a single substrate immersion processor. This method is shown to produce high cleaning efficiencies without damage to 45 nm devices. Further, sonoluminescence studies demonstrate that the transducers are operated in the single bubble sonoluminescence (SBSL) regime, well below the cavitation threshold for transient multiple-bubble sonoluminescence (MBSL).