发明申请
- 专利标题： RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY
- 专利标题（中）： 释放表面，特别用于纳米压印
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申请号： US11932599申请日： 2007-10-31
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公开(公告)号： US20080164637A1公开(公告)日： 2008-07-10
- 发明人: Stephen Y. Chou
- 申请人： Stephen Y. Chou
- 主分类号： B28B3/00
- IPC分类号： B28B3/00
摘要：
The present invention relates to release surfaces, particularly release surfaces with fine features to be replicated, and to lithography which may be used to produce integrated circuits and microdevices. More specifically, the present invention relates to a process of using an improved mold or microreplication surface that creates patterns with ultra fine features in a thin film carried on a surface of a substrate.
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