发明申请
- 专利标题: Lithographic Apparatus, Device Manufacturing Method and Device
- 专利标题(中): 光刻设备,器件制造方法和器件
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申请号: US11948801申请日: 2007-11-30
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公开(公告)号: US20080165332A1公开(公告)日: 2008-07-10
- 发明人: Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
- 申请人: Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/68
- IPC分类号: G03B27/68
摘要:
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.