发明申请
- 专利标题： Magnetic recording element and method of manufacturing magnetic recording element
- 专利标题（中）： 磁记录元件及制造磁记录元件的方法
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申请号： US12076151申请日： 2008-03-14
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公开(公告)号： US20080168649A1公开(公告)日： 2008-07-17
- 发明人: Shinroku Maejima , Shuichi Ueno , Takashi Takenaga , Takeharu Kuroiwa
- 申请人： Shinroku Maejima , Shuichi Ueno , Takashi Takenaga , Takeharu Kuroiwa
- 申请人地址： JP Tokyo
- 专利权人： RENESAS TECHNOLOGY CORP.
- 当前专利权人： RENESAS TECHNOLOGY CORP.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2003-088260 20030327
- 主分类号： G11B5/127
- IPC分类号： G11B5/127
摘要：
A photolithographic process using an X-direction delimiting mask (S11) for aligning respective side faces of a TMR element (1) and a strap (5) situated in a negative X side is performed, to shape the TMR element (1) and the strap (5) into desired configurations. The X-direction delimiting mask (S11) includes a straight edge and is disposed such that the straight edge is parallel to a Y direction and crosses both the TMR element (1) and the strap (5) in plan view. In use of the X-direction delimiting mask (S11), respective portions of the TMR element (1) and the strap (5) situated in a positive X side relative to the straight edge in plan view are covered with the X-direction delimiting mask (S11).
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