发明申请
US20080173327A1 TWO-FLUID NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
审中-公开
双流体喷嘴,基板处理装置和基板处理方法
- 专利标题: TWO-FLUID NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
- 专利标题(中): 双流体喷嘴,基板处理装置和基板处理方法
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申请号: US11954738申请日: 2007-12-12
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公开(公告)号: US20080173327A1公开(公告)日: 2008-07-24
- 发明人: Masahiro Miyagi
- 申请人: Masahiro Miyagi
- 优先权: JP2006-337765 20061215
- 主分类号: B08B3/10
- IPC分类号: B08B3/10 ; B05B5/06
摘要:
A substrate processing apparatus has a two-fluid nozzle having an inner cylindrical member and an outer cylindrical member. Gas flows in the inner cylindrical member which is a gas passage and the processing liquid downwardly flows in a processing liquid passage constituted of the inner and outer cylindrical members. The gas and the processing liquid are mixed in a mixing area below the inner cylindrical member to generate fine droplets, and the droplets are ejected from an outlet of a lower end of the outer cylindrical member onto a substrate. Charge is induced on the processing liquid by generating an electric potential difference between a first electrode provided in the gas passage and a second electrode provided in the processing liquid passage, to generate charged droplets. In the nozzle, the first electrode is isolated from the processing liquid with a simple construction, and the droplets can be charged efficiently.
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