发明申请
US20080182185A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF, AND METHOD FOR RESIZING DIMENSION VARIATION DUE TO LOADING EFFECT
有权
充电颗粒光束写入装置及其方法，以及用于对装载效应进行尺寸变化的方法
- 专利标题： CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF, AND METHOD FOR RESIZING DIMENSION VARIATION DUE TO LOADING EFFECT
- 专利标题（中）： 充电颗粒光束写入装置及其方法，以及用于对装载效应进行尺寸变化的方法
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申请号： US11942307申请日： 2007-11-19
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公开(公告)号： US20080182185A1公开(公告)日： 2008-07-31
- 发明人: Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
- 申请人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
- 申请人地址： JP Numazu-shi
- 专利权人： NuFlare Technology, Inc.
- 当前专利权人： NuFlare Technology, Inc.
- 当前专利权人地址： JP Numazu-shi
- 优先权： JP2006-321246 20061129
- 主分类号： G03C5/00
- IPC分类号： G03C5/00 ; H01J3/14
摘要：
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.
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