发明申请
US20080185577A1 Diimide-based semiconductor materials and methods of preparing and using the same
有权
基于二酰亚胺的半导体材料及其制备和使用方法
- 专利标题: Diimide-based semiconductor materials and methods of preparing and using the same
- 专利标题(中): 基于二酰亚胺的半导体材料及其制备和使用方法
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申请号: US11986019申请日: 2007-11-19
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公开(公告)号: US20080185577A1公开(公告)日: 2008-08-07
- 发明人: Antonio Facchetti , Tobin J. Marks , He Yan
- 申请人: Antonio Facchetti , Tobin J. Marks , He Yan
- 主分类号: H01L51/30
- IPC分类号: H01L51/30 ; C07D471/02 ; B05D1/02 ; B05D1/18 ; C23C16/44 ; H01B1/00
摘要:
Diimide-based semiconductor materials are provided with processes for preparing the same. Composites and electronic devices including the diimide-based semiconductor materials also are provided.
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