Invention Application
- Patent Title: PHOTOTHERMOGRAPHIC MATERIAL
- Patent Title (中): 光电材料
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Application No.: US12019131Application Date: 2008-01-24
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Publication No.: US20080187875A1Publication Date: 2008-08-07
- Inventor: Narito Goto , Kiyokazu Morita , Keiko Itaya
- Applicant: Narito Goto , Kiyokazu Morita , Keiko Itaya
- Applicant Address: JP Tokyo
- Assignee: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
- Current Assignee: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
- Current Assignee Address: JP Tokyo
- Priority: JP2007023895 20070202
- Main IPC: G03C1/04
- IPC: G03C1/04

Abstract:
A photothermographic material is disclosed, comprising on one side of a support a light-sensitive layer comprising a light sensitive silver halide, light-insensitive silver salts resin and a light-insensitive layer and on the other side of the supporr a light-insensitive layer, wherein the light-insensitive layer on the light-sensitive layer side and the light-insensitive layer on the other side of the support comprises a silicon-containing polymer lubricant and a fluorine-containing compound represented by formula (SF): [Rf-(L1)m1-]p-(L2)n1-(A)q Formula (SF)
Public/Granted literature
- US07504200B2 Photothermographic material Public/Granted day:2009-03-17
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