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发明申请
US20080192224A1 Microlithographic Projection Exposure Apparatus 审中-公开
微光刻投影曝光装置

Microlithographic Projection Exposure Apparatus
摘要：
A projection exposure apparatus has a projection lens (10) with an object plane (34), an image plane, an optical axis (28) and a non-telecentric entrance pupil (32). The apparatus further comprises an illumination system (12) having an intermediate field plane (80) and a field stop (36; 36). The field stop is positioned in or in close proximity to the intermediate field plane (80) and defines an illuminated field (14) in the object plane (34) that does not contain the optical axis (28) of the projection lens (24). The illumination system (12) is configured such that, in the object plane (34), a mean of the angles formed between all principal rays (42) emanating from the intermediate field plane (80) on the one hand and the optical axis (28) of the projection lens (24) on the other hand differs from 0°.
摘要（中）：

投影曝光装置具有具有物平面（34），像平面，光轴（28）和非远心入射光瞳（32）的投影透镜（10）。 该装置还包括具有中间场平面（80）和场停止（36; 36）的照明系统（12）。 场停止件位于中间场平面（80）中或紧邻中间场平面（80），并且在物平面（34）中限定不包含投影透镜（24）的光轴（28）的照明场（14） 。 照明系统（12）被配置为使得在物平面（34）中，一方面从中间场平面（80）发射的所有主光线（42）和光轴（42）之间形成的平均角 另一方面，投影透镜（24）的光圈28（28）不同于0°。

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