Invention Application
- Patent Title: Double-Decker Pellicle-Mask Assembly
- Patent Title (中): 双层防护薄膜组件
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Application No.: US11677142Application Date: 2007-02-21
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Publication No.: US20080199783A1Publication Date: 2008-08-21
- Inventor: Shih-Ming Chang , Hung-Chang Hsieh , Burn Jeng Lin
- Applicant: Shih-Ming Chang , Hung-Chang Hsieh , Burn Jeng Lin
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A pellicle-mask assembly includes a mask substrate having an absorber pattern, and a hard pellicle held against movement with respect to the mask substrate by gas pressure.
Information query
