发明申请
- 专利标题： Aqueous Solution and Method for Removing Ionic Contaminants from the Surface of a Workpiece
- 专利标题（中）： 水溶液和从工件表面去除离子污染物的方法
-
申请号： US11995138申请日： 2006-08-21
-
公开(公告)号： US20080200360A1公开(公告)日： 2008-08-21
- 发明人: Thomas Beck , Irene Kubitza , Hans-Jurgen Schreier , Gerhard Steinberger
- 申请人： Thomas Beck , Irene Kubitza , Hans-Jurgen Schreier , Gerhard Steinberger
- 申请人地址： DE Berlin
- 专利权人： Atotech Deutschland GmbH
- 当前专利权人： Atotech Deutschland GmbH
- 当前专利权人地址： DE Berlin
- 优先权： DE102005041533.4 20050831
- 国际申请： PCT/EP2006/008315 WO 20060821
- 主分类号： C11D7/32
- IPC分类号： C11D7/32 ; C11D7/50
摘要：
To reduce ionic contaminants on printed circuit boards that are at least partially covered with a solder resist mask and are provided with top layers on the copper structures, an aqueous cleaning solution is used, which contains at least one ethanolamine compound and/or the salt thereof, at least one alcoholic solvent and, at need, at least one guanidine compound and/or the salt thereof.
信息查询
