发明申请
US20080201126A1 Method of Automatically Generating the Structures From Mask Layout
审中-公开
从面板布局自动生成结构的方法
- 专利标题: Method of Automatically Generating the Structures From Mask Layout
- 专利标题(中): 从面板布局自动生成结构的方法
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申请号: US10552132申请日: 2004-05-19
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公开(公告)号: US20080201126A1公开(公告)日: 2008-08-21
- 发明人: Tae Young Won , Sang Ho Yoon
- 申请人: Tae Young Won , Sang Ho Yoon
- 申请人地址: KR Nam-gu, Incheon
- 专利权人: SANAYI SYSTEM CO., LTD.
- 当前专利权人: SANAYI SYSTEM CO., LTD.
- 当前专利权人地址: KR Nam-gu, Incheon
- 优先权: KR10-2004-0007435 20040205
- 国际申请: PCT/KR2004/001183 WO 20040519
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A method of defining three-dimensional structure from mask layout for computer simulation, which provides a technology for defining a three-dimensional structure of liquid crystal cell which comprises a apparatus of liquid crystal display for designing and analyzing a apparatus of liquid crystal display.A method of generating three-dimensional structure which comprised of material layers between upper substrate and lower substrate, which provides a generation method of three-dimensional structure for computer simulation by depositing material layers under the upper substrate and over the lower substrate, and sandwiching a center insertion layer between the deposited upper and lower material layers for a case which includes tapered structure of material layer for the substrate.
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