发明申请
US20080202673A1 System and method for depositing thin layers on non-planar substrates by stamping
有权
通过冲压在非平面基板上沉积薄层的系统和方法
- 专利标题： System and method for depositing thin layers on non-planar substrates by stamping
- 专利标题（中）： 通过冲压在非平面基板上沉积薄层的系统和方法
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申请号： US11711115申请日： 2007-02-27
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公开(公告)号： US20080202673A1公开(公告)日： 2008-08-28
- 发明人: Stephen Forrest , Xin Xu , Xiangfei Qi , Marcelo Davanco
- 申请人： Stephen Forrest , Xin Xu , Xiangfei Qi , Marcelo Davanco
- 主分类号： B29C63/02
- IPC分类号： B29C63/02
摘要：
An elastomeric stamp is used to deposit material on a non-planar substrate. A vacuum mold is used to deform the elastomeric stamp and pressure is applied to transfer material from the stamp to the substrate. By decreasing the vacuum applied by the vacuum mold, the elasticity of the stamp may be used to apply this pressure. Pressure also may be applied by applying a force to the substrate and/or the stamp. The use of an elastomeric stamp allows for patterned layers to be deposited on a non-planar substrate with reduced chance of damage to the patterned layer.
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