发明申请
- 专利标题： UNDERLAYER COMPOSITIONS CONTAINING HETEROCYCLIC AROMATIC STRUCTURES
- 专利标题（中）： 含有杂环芳族结构的底层组合物
-
申请号： US12105685申请日： 2008-04-18
-
公开(公告)号： US20080213697A1公开(公告)日： 2008-09-04
- 发明人: Wu-Song S. Huang , Karen Temple , Pushkara R. Varanasi
- 申请人： Wu-Song S. Huang , Karen Temple , Pushkara R. Varanasi
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide planarizing underlayers having outstanding optical, mechanical and etch selectivity properties. The present invention also encompasses lithographic structures containing the underlayers prepared from the compositions of the present invention, methods of making such lithographic structures, and methods of using such lithographic structures to pattern underlying material layers on a substrate.
公开/授权文献
信息查询
IPC分类:
