发明申请
US20080215274A1 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
精细图案特征,其设备和半导体器件制造方法的评估方法

Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication
摘要:
Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.
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