Lithographic apparatus and device manufacturing method
摘要:
A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
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