- 专利标题: Lithographic apparatus and device manufacturing method
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申请号: US12081975申请日: 2008-04-24
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公开(公告)号: US20080218722A1公开(公告)日: 2008-09-11
- 发明人: Marc Wilhelmus Maria VAN DER WIJST , Dominicus Jacobus Petrus Adrianus FRANKEN , Erik Roelof LOOPSTRA , Marius RAVENSBERGEN
- 申请人: Marc Wilhelmus Maria VAN DER WIJST , Dominicus Jacobus Petrus Adrianus FRANKEN , Erik Roelof LOOPSTRA , Marius RAVENSBERGEN
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
公开/授权文献
- US07999914B2 Lithographic apparatus and device manufacturing method 公开/授权日:2011-08-16
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