发明申请
- 专利标题: Pattern displacement measuring method and pattern measuring device
- 专利标题(中): 图案位移测量方法和图案测量装置
-
申请号: US11892675申请日: 2007-08-24
-
公开(公告)号: US20080224035A1公开(公告)日: 2008-09-18
- 发明人: Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
- 申请人: Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
- 优先权: JP2006-235876 20060831
- 主分类号: G01C9/00
- IPC分类号: G01C9/00 ; G01N23/00
摘要:
An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.