发明申请
US20080227678A1 Cleaning Liquid for Lithography and Method of Cleaning Therewith
有权
用于平版印刷的清洁液及其清洗方法
- 专利标题: Cleaning Liquid for Lithography and Method of Cleaning Therewith
- 专利标题(中): 用于平版印刷的清洁液及其清洗方法
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申请号: US11791836申请日: 2005-12-26
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公开(公告)号: US20080227678A1公开(公告)日: 2008-09-18
- 发明人: Jun Koshiyama , Yasumitsu Taira , Chima Shinohara
- 申请人: Jun Koshiyama , Yasumitsu Taira , Chima Shinohara
- 申请人地址: JP Kawasaki-shi
- 专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址: JP Kawasaki-shi
- 优先权: JP2004-382130 20041228
- 国际申请: PCT/JP05/23707 WO 20051226
- 主分类号: G03F7/42
- IPC分类号: G03F7/42
摘要:
A cleaning liquid for lithography that exhibits equally excellent cleaning performance for resists of a wide variety of compositions, such as various resists for i-line, KrF and ArF, silicic resist and chemical amplification type positive resist, and that excels in post-treatment dryability, being free from any deterioration of resist performance by cleaning. There is provided a cleaning liquid for lithography, comprising at least one member (A) selected from among lower alkyl esters of acetic acid and propionic acid and at least one member (B) selected from among ketones having 5 to 7 carbon atoms per molecule in a mass ratio of (A):(B) of 4:6 to 7:3.