发明申请
- 专利标题: PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 光伏器件及其制造方法
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申请号: US12045247申请日: 2008-03-10
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公开(公告)号: US20080230121A1公开(公告)日: 2008-09-25
- 发明人: Akira TERAKAWA
- 申请人: Akira TERAKAWA
- 申请人地址: JP Moriguchi City
- 专利权人: SANYO ELECTRIC CO., LTD.
- 当前专利权人: SANYO ELECTRIC CO., LTD.
- 当前专利权人地址: JP Moriguchi City
- 优先权: JPJP2007-070014 20070319
- 主分类号: H01L31/0256
- IPC分类号: H01L31/0256 ; H01L31/18
摘要:
A photovoltaic device capable of improving an output characteristic is provided. The photovoltaic device includes an n-type single-crystal silicon substrate, a p-type amorphous silicon substrate, and a substantially intrinsic i-type amorphous silicon layer disposed between the n-type single-crystal silicon substrate and the p-type amorphous silicon layer. The i-type amorphous silicon layer includes: a first section which is located on the n-type single-crystal silicon substrate side, and which has an oxygen concentration equal to or below 1020 cm−3; and a second section which is located on the p-type amorphous silicon layer side, and which has an oxygen concentration equal to or above 1020 cm−3.
公开/授权文献
- US07893351B2 Photovoltaic device and manufacturing method thereof 公开/授权日:2011-02-22
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