发明申请
- 专利标题: INTEGRATED CIRCUIT AND METHOD FOR PRODUCING THE SAME
- 专利标题(中): 集成电路及其制造方法
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申请号: US12054126申请日: 2008-03-24
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公开(公告)号: US20080230910A1公开(公告)日: 2008-09-25
- 发明人: Minka Gospodinova-Daltcheva , Ingo Wennemuth , Hayri Burak Goekgoez
- 申请人: Minka Gospodinova-Daltcheva , Ingo Wennemuth , Hayri Burak Goekgoez
- 优先权: DE102007014198.1-33 20070324
- 主分类号: H01L23/52
- IPC分类号: H01L23/52 ; H01L21/4763 ; H01L21/44
摘要:
An integrated circuit provides a carrier substrate, a wiring level above a carrier substrate, wherein the wiring level comprises a first conductor track composed of a first conductive material and a second conductor track composed of the first conductive material, an insulating layer above the wiring level, wherein the insulating layer comprises a first opening in a region of the first conductor track of the wiring level and a second opening in a region of the second conductor track of the wiring level and a contact bridge composed of a second conductive material, wherein the contact bridge is connected to the first conductor track in a region of the first opening and is connected to the second conductor track in a region of the second opening.
公开/授权文献
- US08143714B2 Integrated circuit and method for producing the same 公开/授权日:2012-03-27
信息查询
IPC分类: